REACTIVE ION ETCH OF GAAS AND ALGAAS USING BCL3, SICL4 AND SF6, INSTEAD OF CCL2F2

標題:	REACTIVE ION ETCH OF GAAS AND ALGAAS USING BCL3, SICL4 AND SF6, INSTEAD OF CCL2F2
作者:	WU, JW CHANG, CY LIN, KC CHANG, EY HWANG, JH 電控工程研究所 Institute of Electrical and Control Engineering
公開日期:	1994
URI:	http://hdl.handle.net/11536/20111
ISBN:	1-55899-244-8
ISSN:	0272-9172
期刊:	MATERIALS AND PROCESSES FOR ENVIRONMENTAL PROTECTION
Volume:	344
起始頁:	295
結束頁:	299
Appears in Collections:	Conferences Paper