SIMULATION AND FABRICATION OF A NEW PHASE-SHIFTING MASK FOR 0.35 MU-M CONTACT HOLE PATTERN TRANSFER - HALF-TONE-RIM

標題:	SIMULATION AND FABRICATION OF A NEW PHASE-SHIFTING MASK FOR 0.35 MU-M CONTACT HOLE PATTERN TRANSFER - HALF-TONE-RIM
作者:	LOONG, WA SHY, SL GUO, GC CHOU, YL 應用化學系 Department of Applied Chemistry
公開日期:	1994
URI:	http://hdl.handle.net/11536/20163 http://dx.doi.org/10.1117/12.167280
ISBN:	0-8194-1356-9
DOI:	10.1117/12.167280
期刊:	13TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT
Volume:	2087
起始頁:	380
結束頁:	389
Appears in Collections:	Conferences Paper

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