| 標題: | Bipolar conductivity in amorphous HfO(2) |
| 作者: | Islamov, D. R. Gritsenko, V. A. Cheng, C. H. Chin, A. 交大名義發表 National Chiao Tung University |
| 公開日期: | 15-八月-2011 |
| 摘要: | This study calculates the contribution of electrons and holes to HfO(2) conductivity in Si/HfO(2)/Ni structures using experiments on injection of minority carriers from n- and p-type silicon. Results show that electrons and holes contribute to the conductivity of HfO(2), allowing HfO(2) to exhibit two-band conductivity. (C) 2011 American Institute of Physics. [doi:10.1063/1.3626599] |
| URI: | http://dx.doi.org/10.1063/1.3626599 http://hdl.handle.net/11536/20212 |
| ISSN: | 0003-6951 |
| DOI: | 10.1063/1.3626599 |
| 期刊: | APPLIED PHYSICS LETTERS |
| Volume: | 99 |
| Issue: | 7 |
| 起始頁: | |
| 結束頁: | |
| 顯示於類別: | 期刊論文 |

