標題: | Solution-Processed Vertical Organic Transistors Fabricated by Nanoimprint Lithography |
作者: | Wu, Yang-Kai Huang, Jian-Hao Tsai, Wu-Wei Chen, Yung-Pin Lin, Shih-Chieh Hsu, Yung Zan, Hsiao-Wen Meng, Hsin-Fei Wang, Lon A. 物理研究所 光電工程學系 Institute of Physics Department of Photonics |
關鍵字: | Interference lithography;nanoimprint;organic transistor;solution process;vertical transistor |
公開日期: | 1-Feb-2013 |
摘要: | In this letter, we demonstrate the first vertical-channel organic transistor using nanoimprint technology to produce a base electrode with high-density nanometer pores to well control the channel current vertically flowing through the pores. The aspect ratios of nanopores, which determine the switching performance of the vertical transistor, are greatly enhanced by transferring the nanostructure to the underlying layers. Without pore accumulation, a low leakage current can be achieved. The vertical transistor delivers an ON current of 0.35 mA/cm(2) and an ON/OFF current ratio of around 3000 at 1.8 V. The results prove the feasibility to produce low-voltage organic transistors over a large area with potentially low production cost. |
URI: | http://dx.doi.org/10.1109/LED.2012.2235402 http://hdl.handle.net/11536/21021 |
ISSN: | 0741-3106 |
DOI: | 10.1109/LED.2012.2235402 |
期刊: | IEEE ELECTRON DEVICE LETTERS |
Volume: | 34 |
Issue: | 2 |
起始頁: | 313 |
結束頁: | 315 |
Appears in Collections: | Articles |
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