標題: | Evaluation of Temperature Stability of Trilayer Resistive Memories Using Work-Function Tuning |
作者: | Cheng, Chun-Hu Chin, Albert 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
公開日期: | 1-四月-2013 |
摘要: | A trilayer resistive memory with a low picojoule switching energy shows highly uniform current distribution, fast switching speed of 10 ns, and robust endurance cycling of 10(6) cycles under high-temperature (343 K) operation. Such good performance is related to high-temperature stable Ni electrode, fast electron hopping via nanocrystallized anatase TiO2, and nonuniform electric-field distribution to dilute cycling stress. The evaluation of thermal stability is mandatory for the application of reliable high-density three-dimensional nonvolatile memory. (C) 2013 The Japan Society of Applied Physics |
URI: | http://dx.doi.org/10.7567/APEX.6.041203 http://hdl.handle.net/11536/21697 |
ISSN: | 1882-0778 |
DOI: | 10.7567/APEX.6.041203 |
期刊: | APPLIED PHYSICS EXPRESS |
Volume: | 6 |
Issue: | 4 |
結束頁: | |
顯示於類別: | 期刊論文 |