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dc.contributor.authorChen, Chien-Hungen_US
dc.contributor.authorSu, Yi-Jren_US
dc.contributor.authorLin, Chih-Hengen_US
dc.contributor.authorLiao, Tai-Shanen_US
dc.contributor.authorYang, Yuh-Shyongen_US
dc.contributor.authorHwang, Chi-Hungen_US
dc.date.accessioned2014-12-08T15:30:39Z-
dc.date.available2014-12-08T15:30:39Z-
dc.date.issued2013-05-02en_US
dc.identifier.issn1932-7447en_US
dc.identifier.urihttp://dx.doi.org/10.1021/jp401259een_US
dc.identifier.urihttp://hdl.handle.net/11536/21884-
dc.description.abstractNanowire field-effect transistors are suited to. study the activity of biomolecules in bionanotechnology. The changes of biomolecules process are efficiently affected the charge at the nanowire surface; thus, the electrical characterization of NW-FET is Changed. Although NW-FET is a well-known device in bioapplications, however, the intrinsic electrical characterization of NW-FET effect, on real electrical measurement is not well studied. We present herein a novel measurement method to avoid errors in electrical characteristic of nanowire field-effect transistors. A physical model is developed to explore the effect of the leakage current, which is influenced by the charging effect of an equivalent capacitor in a NW-FET. We also present a sloped-gate voltage method to reduce the effect, of equivalent capacitor in air, liquid, and phosphate buffered solution. The application of the sloped gate voltage Method significantly increases the stability of electrical characterization measurements. This method can also be easily applied to biosensing experiments.en_US
dc.language.isoen_USen_US
dc.titleSloped-Gate Voltage Method for Improving Measurement of Poly-Si Nanowire FET in Aqueous Environmenten_US
dc.typeArticleen_US
dc.identifier.doi10.1021/jp401259een_US
dc.identifier.journalJOURNAL OF PHYSICAL CHEMISTRY Cen_US
dc.citation.volume117en_US
dc.citation.issue17en_US
dc.citation.spage9004en_US
dc.citation.epage9008en_US
dc.contributor.department生物科技學系zh_TW
dc.contributor.departmentDepartment of Biological Science and Technologyen_US
dc.identifier.wosnumberWOS:000318536600049-
dc.citation.woscount0-
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