標題: Hopping conduction distance dependent activation energy characteristics of Zn:SiO2 resistance random access memory devices
作者: Chen, Kai-Huang
Zhang, Rui
Chang, Ting-Chang
Tsai, Tsung-Ming
Chang, Kuan-Chang
Lou, J. C.
Young, Tai-Fa
Chen, Jung-Hui
Shih, Chih-Cheng
Tung, Cheng-Wei
Syu, Yong-En
Sze, Simon M.
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期: 1-四月-2013
摘要: In this study, the hopping conduction distance variation of Zn:SiO2 resistance random access memory (RRAM) devices with different operating compliance currents was discussed and verified. To investigate and determine the hopping conduction distance dependent activation energy characteristics, the Arrhenius plot of low resistance state of Zn:SiO2 RRAM devices was applied, from which we proposed carrier conduction model. With the increase of current compliance, more metal ions would accumulate to form precipitates with larger diameter, which in turn resulted in the shortening of hopping distance. Because of shorter hopping distance, activation energy for carrier hopping would decrease. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4799655]
URI: http://dx.doi.org/10.1063/1.4799655
http://hdl.handle.net/11536/21939
ISSN: 0003-6951
DOI: 10.1063/1.4799655
期刊: APPLIED PHYSICS LETTERS
Volume: 102
Issue: 13
結束頁: 
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