標題: | Design of 2 x V-DD-Tolerant I/O Buffer With PVT Compensation Realized by Only 1 x V-DD Thin-Oxide Devices |
作者: | Ker, Ming-Dou Chiu, Po-Yen 電子工程學系及電子研究所 生醫電子轉譯研究中心 Department of Electronics Engineering and Institute of Electronics Biomedical Electronics Translational Research Center |
關鍵字: | Gate-oxide overstress;mixed-voltage I/O buffer;process, voltage, and temperature (PVT) variation |
公開日期: | 1-十月-2013 |
摘要: | A new 2 x V-DD-tolerant input/output (I/O) buffer with process, voltage, and temperature (PVT) compensation is proposed and verified in a 90-nm CMOS process. Consisting of the dynamic source bias and gate controlled technique, the proposed mixed-voltage I/O buffer realized by only 1xV(DD) devices can successfully transmit and receive 2 x V-DD signal. Utilizing this technique with only 1xV(DD) devices, the digital logic gates are also modified to have 2xV(DD)-tolerant capability. With 2xV(DD)-tolerant logic gates, the PVT variation detector has been implemented to detect PVT variations from 2 x V-DD signal and provide compensation control to the 2 x V-DD-tolerant I/O buffer without suffering the gate-oxide overstress issue. |
URI: | http://dx.doi.org/10.1109/TCSI.2013.2244351 http://hdl.handle.net/11536/22696 |
ISSN: | 1549-8328 |
DOI: | 10.1109/TCSI.2013.2244351 |
期刊: | IEEE TRANSACTIONS ON CIRCUITS AND SYSTEMS I-REGULAR PAPERS |
Volume: | 60 |
Issue: | 10 |
起始頁: | 2549 |
結束頁: | 2560 |
顯示於類別: | 期刊論文 |