標題: Design of 2 x V-DD-Tolerant I/O Buffer With PVT Compensation Realized by Only 1 x V-DD Thin-Oxide Devices
作者: Ker, Ming-Dou
Chiu, Po-Yen
電子工程學系及電子研究所
生醫電子轉譯研究中心
Department of Electronics Engineering and Institute of Electronics
Biomedical Electronics Translational Research Center
關鍵字: Gate-oxide overstress;mixed-voltage I/O buffer;process, voltage, and temperature (PVT) variation
公開日期: 1-Oct-2013
摘要: A new 2 x V-DD-tolerant input/output (I/O) buffer with process, voltage, and temperature (PVT) compensation is proposed and verified in a 90-nm CMOS process. Consisting of the dynamic source bias and gate controlled technique, the proposed mixed-voltage I/O buffer realized by only 1xV(DD) devices can successfully transmit and receive 2 x V-DD signal. Utilizing this technique with only 1xV(DD) devices, the digital logic gates are also modified to have 2xV(DD)-tolerant capability. With 2xV(DD)-tolerant logic gates, the PVT variation detector has been implemented to detect PVT variations from 2 x V-DD signal and provide compensation control to the 2 x V-DD-tolerant I/O buffer without suffering the gate-oxide overstress issue.
URI: http://dx.doi.org/10.1109/TCSI.2013.2244351
http://hdl.handle.net/11536/22696
ISSN: 1549-8328
DOI: 10.1109/TCSI.2013.2244351
期刊: IEEE TRANSACTIONS ON CIRCUITS AND SYSTEMS I-REGULAR PAPERS
Volume: 60
Issue: 10
起始頁: 2549
結束頁: 2560
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