完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Yu, DS | en_US |
dc.contributor.author | Liao, CC | en_US |
dc.contributor.author | Chen, CC | en_US |
dc.contributor.author | Lee, CF | en_US |
dc.contributor.author | Cheng, CF | en_US |
dc.contributor.author | Chin, A | en_US |
dc.contributor.author | McAlister, SP | en_US |
dc.date.accessioned | 2014-12-08T15:37:03Z | - |
dc.date.available | 2014-12-08T15:37:03Z | - |
dc.date.issued | 2005 | en_US |
dc.identifier.issn | 0013-4651 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/25441 | - |
dc.identifier.uri | http://dx.doi.org/10.1149/1.1949088 | en_US |
dc.description.abstract | We have used three-dimensional (3D) integration to reduce the ac power consumption in interconnects, which is the most severe issue beyond the dc power arising from the gate dielectric leakage current. From a direct calculation of the ac power consumption using an electromagnetic method, we show that both the ac power consumption and maximum operation frequency can be improved by integrating an additional integrated circuit layer. The 3D integration was realized by Ge-on-insulator (GOI) complementary metal oxide semiconductor field effect transistors (CMOSFETs) on 1-poly-6-metal (1P6M) 0.18 mu m Si devices, where little performance degradation was measured in the lower layer 0.18 mu m Si MOSFETs, due to the inherent low thermal budget (500 degrees C rapid thermal anneal) of the GOI processing. The drive current of the 3D GOI n- and p-MOSFETs was more than double that of the control Si devices, providing another advantage of the approach. (c) 2005 The Electrochemical Society. All rights reserved. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Reducing AC power consumption by three-dimensional integration of Ge-on-insulator CMOS on 1-poly-6-metal 0.18 mu m Si MOSFETs | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1149/1.1949088 | en_US |
dc.identifier.journal | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | en_US |
dc.citation.volume | 152 | en_US |
dc.citation.issue | 8 | en_US |
dc.citation.spage | G684 | en_US |
dc.citation.epage | G687 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000230494000075 | - |
dc.citation.woscount | 0 | - |
顯示於類別: | 期刊論文 |