Chemoselective deprotection of acid labile primary hydroxyl protecting groups under CBr4-photoirradiation conditions

標題:	Chemoselective deprotection of acid labile primary hydroxyl protecting groups under CBr4-photoirradiation conditions
作者:	Chen, MY Patkar, LN Lu, KC Lee, ASY Lin, CC 應用化學系 Department of Applied Chemistry
關鍵字:	CBr4-photoirradiation;deprotection
公開日期:	6-十二月-2004
摘要:	The CBr4-photoirradiation in methanol generates a controlled source of HBr, which can chemoselectively deprotect commonly used hydroxyl-protecting groups in saccharides and nucleosides, such as tert-butyldimethylsilyl, isopropylidene, benzylidene and triphenyl ethers in the presence of other acid-labile functional groups. (C) 2004 Elsevier Ltd. All rights reserved.
URI:	http://dx.doi.org/10.1016/j.tet.2004.09.095 http://hdl.handle.net/11536/25557
ISSN:	0040-4020
DOI:	10.1016/j.tet.2004.09.095
期刊:	TETRAHEDRON
Volume:	60
Issue:	50
起始頁:	11465
結束頁:	11475
顯示於類別：	期刊論文

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