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dc.contributor.authorChang, KMen_US
dc.contributor.authorWang, HPen_US
dc.date.accessioned2014-12-08T15:37:17Z-
dc.date.available2014-12-08T15:37:17Z-
dc.date.issued2004-12-01en_US
dc.identifier.issn0268-1242en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0268-1242/19/12/012en_US
dc.identifier.urihttp://hdl.handle.net/11536/25618-
dc.description.abstractIn this paper, we propose a simple two-dimensional (2D) analytical threshold voltage model for deep-submicrometre fully depleted SOI MOSFETs using the three-zone Green's function technique to solve the 2D Poisson equation and adopting a new concept of the average electric field to avoid iterations in solving the position of the minimum surface potential. Firstly, we obtain the 2D potential distribution in the Si-film region by using the Green's function technique to solve the 2D Poisson equation. Then, by applying Gauss's law at the Si-SiO2 interface, the initial expression of the threshold voltage is obtained. Eventually, we introduce a modified factor to compensate for the errors resulting from the charge-sharing effect in the derivations of the final threshold voltage model. The proposed model is validated against the results obtained by 2D numerical analysis and experimental data, and excellent agreements are obtained. The proposed model has an explicit expression and can be implemented into the circuit simulator.en_US
dc.language.isoen_USen_US
dc.titleA simple 2D analytical threshold voltage model for fully depleted short-channel silicon-on-insulator MOSFETsen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/0268-1242/19/12/012en_US
dc.identifier.journalSEMICONDUCTOR SCIENCE AND TECHNOLOGYen_US
dc.citation.volume19en_US
dc.citation.issue12en_US
dc.citation.spage1397en_US
dc.citation.epage1405en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000225659400016-
dc.citation.woscount4-
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