完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Lai, F | en_US |
dc.contributor.author | Chang, YH | en_US |
dc.contributor.author | Hsueh, TH | en_US |
dc.contributor.author | Huang, HW | en_US |
dc.contributor.author | Laih, LH | en_US |
dc.contributor.author | Kuo, HC | en_US |
dc.contributor.author | Wang, SC | en_US |
dc.contributor.author | Guung, TC | en_US |
dc.date.accessioned | 2014-12-08T15:37:18Z | - |
dc.date.available | 2014-12-08T15:37:18Z | - |
dc.date.issued | 2004-11-15 | en_US |
dc.identifier.issn | 0921-5107 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1016/j.mseb.2004.07.091 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/25645 | - |
dc.description.abstract | We demonstrated the enhancement in the performance of proton-implanted GaAs VCSEL by incorporation of a new p-contact scheme using a Ti and ITO transparent overcoating on the regular p-contact. The kink characteristics in light output power versus current (L-I) curve of the VCSEL with the Ti/ITO overcoating were improved with a reduction in the derivative kink factor of as large as 70%. The high-speed response of the overcoated device also shows a more open clear eye and lower jitter of 35 ps operating at 2.125 Gb/s under 10 mA bias and 9 dB extinction ratio compared to the no overcoated device. Better current spreading and uniformity induced by the overcoating could be responsible for these performance improvements. (C) 2004 Elsevier B.V. All rights reserved. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | VCSEL | en_US |
dc.subject | proton implant | en_US |
dc.subject | indium-tin-oxide | en_US |
dc.subject | kink | en_US |
dc.subject | high-speed operation | en_US |
dc.title | Improvement of kink characteristics performance of GaAsVCSEL with a indium-tin-oxide top transparent overcoating | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1016/j.mseb.2004.07.091 | en_US |
dc.identifier.journal | MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | en_US |
dc.citation.volume | 113 | en_US |
dc.citation.issue | 3 | en_US |
dc.citation.spage | 203 | en_US |
dc.citation.epage | 206 | en_US |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Department of Photonics | en_US |
dc.identifier.wosnumber | WOS:000224946000005 | - |
dc.citation.woscount | 0 | - |
顯示於類別: | 期刊論文 |