Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Wu, Chih-Yuan | en_US |
dc.contributor.author | Tra Vu Thanh | en_US |
dc.contributor.author | Chen, Yi-Fu | en_US |
dc.contributor.author | Lee, Jui-Kan | en_US |
dc.contributor.author | Lin, Juhn-Jong | en_US |
dc.date.accessioned | 2014-12-08T15:38:16Z | - |
dc.date.available | 2014-12-08T15:38:16Z | - |
dc.date.issued | 2010-12-15 | en_US |
dc.identifier.issn | 0021-8979 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1063/1.3524522 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/26220 | - |
dc.description.abstract | We report our measurements of thermopower, S (T), on a series of indium tin oxide thin films from 300 down to 5 K to extract the carrier concentration n. The temperature behavior of S (T) below 300 K can be essentially described by a prevailing linear diffusive contribution. In this wide temperature interval, the phonon-drag thermopower is negligible relative to the diffusive thermopower. Therefore, the free-electronlike characteristic is clearly addressed. It should be stressed that linearity in S(d) from liquid-helium temperatures all the way up to room temperatures is seldom seen even in simple metals. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3524522] | en_US |
dc.language.iso | en_US | en_US |
dc.title | Free-electronlike diffusive thermopower of indium tin oxide thin films | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.3524522 | en_US |
dc.identifier.journal | JOURNAL OF APPLIED PHYSICS | en_US |
dc.citation.volume | 108 | en_US |
dc.citation.issue | 12 | en_US |
dc.citation.epage | en_US | |
dc.contributor.department | 電子物理學系 | zh_TW |
dc.contributor.department | 物理研究所 | zh_TW |
dc.contributor.department | Department of Electrophysics | en_US |
dc.contributor.department | Institute of Physics | en_US |
dc.identifier.wosnumber | WOS:000285768800054 | - |
dc.citation.woscount | 9 | - |
Appears in Collections: | Articles |
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