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dc.contributor.authorWu, Chih-Yuanen_US
dc.contributor.authorTra Vu Thanhen_US
dc.contributor.authorChen, Yi-Fuen_US
dc.contributor.authorLee, Jui-Kanen_US
dc.contributor.authorLin, Juhn-Jongen_US
dc.date.accessioned2014-12-08T15:38:16Z-
dc.date.available2014-12-08T15:38:16Z-
dc.date.issued2010-12-15en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3524522en_US
dc.identifier.urihttp://hdl.handle.net/11536/26220-
dc.description.abstractWe report our measurements of thermopower, S (T), on a series of indium tin oxide thin films from 300 down to 5 K to extract the carrier concentration n. The temperature behavior of S (T) below 300 K can be essentially described by a prevailing linear diffusive contribution. In this wide temperature interval, the phonon-drag thermopower is negligible relative to the diffusive thermopower. Therefore, the free-electronlike characteristic is clearly addressed. It should be stressed that linearity in S(d) from liquid-helium temperatures all the way up to room temperatures is seldom seen even in simple metals. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3524522]en_US
dc.language.isoen_USen_US
dc.titleFree-electronlike diffusive thermopower of indium tin oxide thin filmsen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.3524522en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume108en_US
dc.citation.issue12en_US
dc.citation.epageen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department物理研究所zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentInstitute of Physicsen_US
dc.identifier.wosnumberWOS:000285768800054-
dc.citation.woscount9-
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