Title: | 0.13-mu m low-kappa-Cu CMOS logic-based technology for 2.1-Gb high data rate read-channel |
Authors: | Guo, JC Lien, WY Tsai, TL Chen, SM Wu, CM 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
Keywords: | dual-gate oxide;high-performance analog (HPA);read-channel |
Issue Date: | 1-May-2004 |
Abstract: | High-performance analog/digital elements have been successfully fabricated bya 0.13-mum low-kappa-Cu logic-based mixed-signal CMOS process in a single chip to enable a 2.1-Gb/s read-channel for hard disk drives that is a record-high data rate supported by fully CMOS solution. The high-performance analog devices demonstrate superior drivability, matching, noise immunity, and reliability by a unique dual-gate oxide module to support the aggressive oxide thickness scaling and maintain promisingly good reliability in all aspects. |
URI: | http://dx.doi.org/10.1109/TED.2004.826884 http://hdl.handle.net/11536/26844 |
ISSN: | 0018-9383 |
DOI: | 10.1109/TED.2004.826884 |
Journal: | IEEE TRANSACTIONS ON ELECTRON DEVICES |
Volume: | 51 |
Issue: | 5 |
Begin Page: | 757 |
End Page: | 763 |
Appears in Collections: | Articles |
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