Direct Patterning of low-k hydrogen silsesquioxane using X-ray exposure technology (vol 6, pg G69, 2003)

標題:	Direct Patterning of low-k hydrogen silsesquioxane using X-ray exposure technology (vol 6, pg G69, 2003)
作者:	Chang, TC Tsai, TM Liu, PT Mor, YS Chen, CW Sheu, JT Tseng, TY 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics
公開日期:	1-Jul-2003
URI:	http://dx.doi.org/10.1149/1.1576571 http://hdl.handle.net/11536/27766
ISSN:	1099-0062
DOI:	10.1149/1.1576571
期刊:	ELECTROCHEMICAL AND SOLID STATE LETTERS
Volume:	6
Issue:	7
起始頁:	L3
結束頁:	L3
Appears in Collections:	Articles

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