標題: | High power Al0.3Ga0.7As/In0.2Ga0.8As enhancement-mode PHEMT for low-voltage wireless communication systems |
作者: | Chen, SH Chang, L Chang, EY Wu, JW Chang, CY 材料科學與工程學系 電子工程學系及電子研究所 友訊交大聯合研發中心 Department of Materials Science and Engineering Department of Electronics Engineering and Institute of Electronics D Link NCTU Joint Res Ctr |
公開日期: | 29-Aug-2002 |
摘要: | A 20 mm-wide enhancement-mode pseudomorphic high-electron-mobility transistor (E-PHEMT) has been developed. The device has high transconductance of 490 mS/mm, and high maximum drain current of 350 mA/mm due to the use of an Al(0.3)G(4.7)As/In0.2Ga0.8As-based structure for carrier confinement. At 1.9 GHz and 3.0 V, the E-PHEMT shows 34.1 dBm (128 mW/mm) output power with power-added efficiency (PAE) of 64.5%. At 2.4 V, the maximum saturated output power is 32.25 dBm and maximum PAE is 78.5%. The E-PHEMT demonstrates excellent power performance at 1.9 GHz and below 3 V. |
URI: | http://dx.doi.org/10.1049/el:20020700 http://hdl.handle.net/11536/28573 |
ISSN: | 0013-5194 |
DOI: | 10.1049/el:20020700 |
期刊: | ELECTRONICS LETTERS |
Volume: | 38 |
Issue: | 18 |
起始頁: | 1063 |
結束頁: | 1064 |
Appears in Collections: | Articles |
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