标题: ESD protection design for CMOS RF integrated circuits using polysilicon diodes
作者: Ker, MD
Chang, CY
电子工程学系及电子研究所
Department of Electronics Engineering and Institute of Electronics
公开日期: 1-六月-2002
摘要: ESD protection design for CMOS RF integrated circuits is proposed in this paper by using the stacked polysilicon diodes as the input ESD protection devices to reduce the total input capacitance and to avoid the noise coupling from the common substrate. The ESD level of the stacked polysilicon diodes on the I/O pad is restored by using the turn-on efficient power-rail ESD clamp circuit, which is constructed by substrate-triggered technique. This polysilicon diode is fully process compatible to general sub-quarter-micron CMOS processes. (C) 2002 Elsevier Science Ltd. All rights reserved.
URI: http://dx.doi.org/10.1016/S0026-2714(02)00049-5
http://hdl.handle.net/11536/28745
ISSN: 0026-2714
DOI: 10.1016/S0026-2714(02)00049-5
期刊: MICROELECTRONICS RELIABILITY
Volume: 42
Issue: 6
起始页: 863
结束页: 872
显示于类别:Articles


文件中的档案:

  1. 000176804000011.pdf

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.