标题: Analysis of temperature effects on high-frequency characteristics of RF lateral-diffused metal-oxide-semiconductor transistors
作者: Hu, Hsin-Hui
Chen, Kun-Ming
Huang, Guo-Wei
Chien, Alex
Cheng, Eric
Yang, Yu-Chi
Chang, Chun-Yen
电子工程学系及电子研究所
Department of Electronics Engineering and Institute of Electronics
关键字: cutoff frequency;layout structure;LDMOS;maximum oscillation frequency;S-parameters;temperature
公开日期: 1-四月-2008
摘要: In this work, the effects of temperature on the DC and RF characteristics of lateral-diffused metal-oxide-semi conductor (LDMOS) transistors were studied. Devices with different layout structures were fabricated using a 40 V LDMOS process. The temperature coefficients of the threshold voltage and channel mobility are negative and their values are similar for devices with fishbone and ring structures. In addition, we found that both the cutoff frequency (f(T)) and the maximum oscillation frequency (f(max)) decrease with increasing temperature. The variations of f(T) with different temperatures are not only affected by the change in transconductance but also affected by the drain resistance. Finally, the temperature behaviors of S-parameters were measured, and the ring structure showed less S(22) variation with different temperatures than the fishbone structure. We extracted the model parameters of the devices to explain this observation.
URI: http://dx.doi.org/10.1143/JJAP.47.2650
http://hdl.handle.net/11536/29931
ISSN: 0021-4922
DOI: 10.1143/JJAP.47.2650
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS
Volume: 47
Issue: 4
起始页: 2650
结束页: 2655
显示于类别:Conferences Paper


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