標題: Fabrication and characterization of Cu-SiCp composites for electrical discharge machining applications
作者: Shu, KM
Tu, GC
材料科學與工程學系
Department of Materials Science and Engineering
關鍵字: copper-based composite;density;electrical discharge machining;electrical resistivity;electrode wear ratio;electroless copper plating;fracture surface;hardness;material removal rate;metal matrix composite;porosity;powder metallurgy;silicon carbide;tensile strength;thermal expansion coefficient
公開日期: 2001
摘要: Cu-SiCp composites made by the powder metallurgy method were investigated. To avoid the adverse effect of Cu-SiCp reaction, sintering was controlled at a reaction temperature less than 1032 K. Electroless plating was employed to deposit a copper film on SiCp powder before mixing with Cu powder in order to improve the bonding status between Cu and SiC particles during sintering. It was found that a continuous copper film could be deposited on SiCp by electroless copper plating, and a uniform distribution of SiCp in Cu matrix could be achieved after the sintering and extrusion process. The mechanical properties of Cu-SiCp composites with SiCp contents from 0.6 to 10 wt% were improved evidently, whereas electrical properties remained almost unchanged as compared with that of the pure copper counterpart. In the electrical discharge machining (EDM) test, the as-formed composite electrodes exhibited a character of lower electrode wear ratio, justifying its usage. The optimum conditions for EDM were Cu-2 wt% SiC. composite electrode operating with a pulse time of 150 mu sec.
URI: http://hdl.handle.net/11536/29971
http://dx.doi.org/10.1081/AMP-100108522
ISSN: 1042-6914
DOI: 10.1081/AMP-100108522
期刊: MATERIALS AND MANUFACTURING PROCESSES
Volume: 16
Issue: 4
起始頁: 483
結束頁: 502
顯示於類別:期刊論文


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