標題: | Fabrication and characterization of Cu-SiCp composites for electrical discharge machining applications |
作者: | Shu, KM Tu, GC 材料科學與工程學系 Department of Materials Science and Engineering |
關鍵字: | copper-based composite;density;electrical discharge machining;electrical resistivity;electrode wear ratio;electroless copper plating;fracture surface;hardness;material removal rate;metal matrix composite;porosity;powder metallurgy;silicon carbide;tensile strength;thermal expansion coefficient |
公開日期: | 2001 |
摘要: | Cu-SiCp composites made by the powder metallurgy method were investigated. To avoid the adverse effect of Cu-SiCp reaction, sintering was controlled at a reaction temperature less than 1032 K. Electroless plating was employed to deposit a copper film on SiCp powder before mixing with Cu powder in order to improve the bonding status between Cu and SiC particles during sintering. It was found that a continuous copper film could be deposited on SiCp by electroless copper plating, and a uniform distribution of SiCp in Cu matrix could be achieved after the sintering and extrusion process. The mechanical properties of Cu-SiCp composites with SiCp contents from 0.6 to 10 wt% were improved evidently, whereas electrical properties remained almost unchanged as compared with that of the pure copper counterpart. In the electrical discharge machining (EDM) test, the as-formed composite electrodes exhibited a character of lower electrode wear ratio, justifying its usage. The optimum conditions for EDM were Cu-2 wt% SiC. composite electrode operating with a pulse time of 150 mu sec. |
URI: | http://hdl.handle.net/11536/29971 http://dx.doi.org/10.1081/AMP-100108522 |
ISSN: | 1042-6914 |
DOI: | 10.1081/AMP-100108522 |
期刊: | MATERIALS AND MANUFACTURING PROCESSES |
Volume: | 16 |
Issue: | 4 |
起始頁: | 483 |
結束頁: | 502 |
顯示於類別: | 期刊論文 |