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dc.contributor.authorSun, KWen_US
dc.contributor.authorSong, TSen_US
dc.contributor.authorWang, SYen_US
dc.contributor.authorLee, CPen_US
dc.date.accessioned2014-12-08T15:45:17Z-
dc.date.available2014-12-08T15:45:17Z-
dc.date.issued2000-05-01en_US
dc.identifier.issn0167-9317en_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0167-9317(99)00475-Xen_US
dc.identifier.urihttp://hdl.handle.net/11536/30529-
dc.description.abstractWe present new time-resolved measurements that demonstrate the effect of injected carrier densities on carrier-carrier scattering rates of highly nonequilibrium carrier distributions in the p-doped Al0.32Ga0.68As/GaAs quantum wells with well width of 5 and 3 nm. The spectra at high densities (greater than or equal to 10(10) cm(-2)) demonstrate that the initially narrow electron distribution is altered in a time less than or equal to the LO phonon emission time as the result of rapid carrier-carrier scattering. At about the same excitation density (similar to 10(10) cm(-2)), the carrier-carrier scattering rate is faster in 3 nm quantum wells in comparison to 5 nm wells. Our results also indicate that carrier-carrier scattering becomes as significant as LO phonon emission at density of about 1 X 10(10) cm(-2) in the 5 nm quantum wells. (C) 2000 Elsevier Science B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectcarrier-carrier scatteringen_US
dc.subjectLO phonon emissionen_US
dc.subjectnonthermal carrier distributionsen_US
dc.titleNonthermal carrier dynamics in AlxGa1-xAs/GaAs quantum wellsen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1016/S0167-9317(99)00475-Xen_US
dc.identifier.journalMICROELECTRONIC ENGINEERINGen_US
dc.citation.volume51-2en_US
dc.citation.issueen_US
dc.citation.spage189en_US
dc.citation.epage194en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000087431500025-
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