標題: | The fabrication of nanomesas and nanometal contacts by using atomic force microscopy lithography |
作者: | Chung, Tung-Hsun Liao, Wen-Hsuan Lin, Shih-Yen 光電工程學系 Department of Photonics |
公開日期: | 1-Nov-2010 |
摘要: | The influence of preoxidation GaAs surface treatment over the atomic force microscopy-induced local anodic oxidation (LAO) is investigated in this paper. By immerging the GaAs samples into NaOH aqueous solutions, higher nano-oxides with better height distribution could be observed after LAO. The phenomenon is attributed to the hydrophilic surfaces obtained after the treatment such that higher local humidity and uniform water molecular distribution would be obtained on the GaAs surfaces, by using the higher nano-oxides with better height uniformity, nanomesas by using wet chemical etching, and nanometal contact after oxide lift-off are fabricated. (C) 2010 American Institute of Physics. [doi:10.1063/1.3504654] |
URI: | http://dx.doi.org/10.1063/1.3504654 http://hdl.handle.net/11536/32044 |
ISSN: | 0021-8979 |
DOI: | 10.1063/1.3504654 |
期刊: | JOURNAL OF APPLIED PHYSICS |
Volume: | 108 |
Issue: | 9 |
起始頁: | |
結束頁: | |
Appears in Collections: | Articles |
Files in This Item:
If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.