Title: New CMOS-Compatible Micromachined Embedded Coplanar Waveguide
Authors: Lin, Chih-Peng
Jou, Christina F.
電信工程研究所
Institute of Communications Engineering
Keywords: Coplanar waveguide (CPW);micromachining technology;transmission line
Issue Date: 1-Sep-2010
Abstract: This paper proposes a new robust micromachined embedded coplanar waveguide (CPW). The central and ground plates are partially bent and overlapped within the trench, and due to tight coupling of the E-field between the overlapped plates, the micromachined embedded CPW line is capable of a wide range characteristic impedance 17.9-92.3 Omega), in a compact size. Furthermore, the area in which the E-field radiates into the substrate of the micromachined embedded CPW is quite narrow compared to conventional CPWs, and therefore, the dielectric loss of the micromachined embedded CPW can be effectively suppressed. Compared with conventional CPW lines, the embedded CPW lines have shown a marked reduction in loss, especially in the low-impedance range. The micromachined embedded CPW lines on the high-resistivity silicon substrate (rho(s) = 15 000 Omega . cm))achieve a measured loss as low as 0.81 dB/cm at 50 GHz. Moreover, the fabrication process of the micromachined embedded CPW line is compatible with the CMOS process. These features make micromachined embedded CPW a promising transmission line for RF integrated circuit application.
URI: http://dx.doi.org/10.1109/TMTT.2010.2058552
http://hdl.handle.net/11536/32225
ISSN: 0018-9480
DOI: 10.1109/TMTT.2010.2058552
Journal: IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES
Volume: 58
Issue: 9
Begin Page: 2511
End Page: 2516
Appears in Collections:Articles


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