尖狀氧化鋅奈米柱陣列之製備與場發射特性之研究

Abstract

近年來，利用奈米材料當作場發射顯示器的發射源已被廣泛地研究，其中以低溫製備的氧化鋅奈米柱最受到注意。但氧化鋅奈米柱本身場發射特性不足以應用於場發射顯示器上，因此在本論文中，我們藉由濕式與乾式蝕刻的方式，將柱狀的氧化鋅變成尖狀，以改善其場發射特性。濕式蝕刻是用稀釋的醋酸去蝕刻未退火與退火過的奈米柱，而乾式蝕刻是用氬離子轟擊奈米柱。為了更進一步提升其場發射特性，我們結合濕式與乾式蝕刻的二段蝕刻去形成更尖銳的奈米柱。經量測結果顯示利用二段蝕刻出的尖狀氧化鋅奈米柱，具有最佳的場發射特性與穩定性，其可降低兩倍以上的工作電壓，如此可減少場發射顯示器的功率消耗。

In recent years, nanostructures used as emitter sources of field emission display have been researched extensively. ZnO nanorods fabricated by low process temperature attract much attention specifically. But they can not be applicable to field emission display due to bad field emission properties themselves. To improve the properties, we use wet and dry etching to sharpen ZnO nanorods in this thesis. For wet etching, we use dilute acetic acid to etch the non-annealed and the annealed nanorods. For dry etching, we use argon ion to bombard nanorods. Also, to improve the properties further, two-step etching combining wet with dry etching is used to form sharper nanorods. From our results, two-step etching exhibits the best field emission properties and stability. It can reduce over twice in the work voltage so that power consumption of field emission is lowered effectively.