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dc.contributor.authorHO, JHen_US
dc.contributor.authorLEE, CLen_US
dc.contributor.authorLEI, TFen_US
dc.contributor.authorCHAO, TSen_US
dc.date.accessioned2014-12-08T15:05:38Z-
dc.date.available2014-12-08T15:05:38Z-
dc.date.issued1990-02-01en_US
dc.identifier.issn0740-3232en_US
dc.identifier.urihttp://dx.doi.org/10.1364/JOSAA.7.000196en_US
dc.identifier.urihttp://hdl.handle.net/11536/4180-
dc.language.isoen_USen_US
dc.titleELLIPSOMETRY MEASUREMENT OF THE COMPLEX REFRACTIVE-INDEX AND THICKNESS OF POLYSILICON THIN-FILMSen_US
dc.typeArticleen_US
dc.identifier.doi10.1364/JOSAA.7.000196en_US
dc.identifier.journalJOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISIONen_US
dc.citation.volume7en_US
dc.citation.issue2en_US
dc.citation.spage196en_US
dc.citation.epage205en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.identifier.wosnumberWOS:A1990CK60100002-
dc.citation.woscount14-
Appears in Collections:Articles


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