標題: ELLIPSOMETRY MEASUREMENTS ON SIO2-FILMS FOR THICKNESSES UNDER 200-A
作者: HO, JH
LEE, CL
JEN, CW
LEI, TF
交大名義發表
電控工程研究所
National Chiao Tung University
Institute of Electrical and Control Engineering
公開日期: 1-Sep-1987
URI: http://hdl.handle.net/11536/4621
ISSN: 0038-1101
期刊: SOLID-STATE ELECTRONICS
Volume: 30
Issue: 9
起始頁: 973
結束頁: 981
Appears in Collections:Articles