ELLIPSOMETRY MEASUREMENTS ON SIO2-FILMS FOR THICKNESSES UNDER 200-A

標題:	ELLIPSOMETRY MEASUREMENTS ON SIO2-FILMS FOR THICKNESSES UNDER 200-A
作者:	HO, JH LEE, CL JEN, CW LEI, TF 交大名義發表電控工程研究所 National Chiao Tung University Institute of Electrical and Control Engineering
公開日期:	1-Sep-1987
URI:	http://hdl.handle.net/11536/4621
ISSN:	0038-1101
期刊:	SOLID-STATE ELECTRONICS
Volume:	30
Issue:	9
起始頁:	973
結束頁:	981
Appears in Collections:	Articles