THE EFFECTS OF THERMAL NITRIDATION CONDITIONS ON THE RELIABILITY OF THIN NITRIDED OXIDE-FILMS

標題:	THE EFFECTS OF THERMAL NITRIDATION CONDITIONS ON THE RELIABILITY OF THIN NITRIDED OXIDE-FILMS
作者:	TSAI, HH WU, LC WU, CY HU, CM 工學院 College of Engineering
公開日期:	1-Apr-1987
URI:	http://hdl.handle.net/11536/4649
ISSN:	0741-3106
期刊:	IEEE ELECTRON DEVICE LETTERS
Volume:	8
Issue:	4
起始頁:	143
結束頁:	145
Appears in Collections:	Articles

Files in This Item:

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.