化學氣相沉積反應室內旋轉基板旋轉效應對於流場影響之研究

Abstract

本文主要以實驗的方式，對常壓化學氣相沉積反應室內流場情形進行分析，同時應用粒子影像測速儀作為反應室內流場可視化的主要設備。藉由改變不同的進氣流量、進氣高度、基板溫度以及基板旋轉等，粒子影像測速儀則拍攝並探討反應腔內的流場分布情形。基板在加溫和旋轉下會分別因熱浮力效應以及旋轉效應影響，使腔體內產生不同型式的渦流。另外進氣量以及進氣高度會影響腔體內流場的穩定性。實驗結果中，單孔進氣式之CVD腔體中，會因不同的熱浮力效應與旋轉效應造成不同的流場變化。基板靜止情形下，進氣高度造成的熱浮力效應將比增加基板溫差來的明顯。而旋轉基板中，若基板到達一定轉速，旋轉效應將取代熱浮力效應主導整個流場的變化。

The flow field of the Chemical Vapor Deposition chamber was experimentally measured. In order to observe the field flow and velocity distribution in the chamber, particle image velocimetry was used as the flow visualization technique. There are several experimental parameters which effect the chamber flow field and stability such as inlet flow rate, impinging height, substrate temperature and disk rotational speed. The result shows that, in the single jet atmospheric chamber, the buoyancy force and rotating Reynolds Number cause different patterns of flow fields and vortex. In the stationary substrate, increasing impinging height has stronger effects on buoyancy force than increasing substrate temperature. On the other hands, the rotating effect dominates the flow field in the chamber when the rotating disk reaches a specific rotational speed.