| 標題: | A MODEL FOR THE DEPOSITION OF PHOSPHORUS IN SILICON |
| 作者: | GUO, SF 電控工程研究所 Institute of Electrical and Control Engineering |
| 公開日期: | 1982 |
| URI: | http://hdl.handle.net/11536/4985 |
| ISSN: | 0013-4651 |
| 期刊: | JOURNAL OF THE ELECTROCHEMICAL SOCIETY |
| Volume: | 129 |
| Issue: | 3 |
| 起始頁: | C101 |
| 結束頁: | C101 |
| 顯示於類別: | 期刊論文 |

