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dc.contributor.authorLin, Da-Wenen_US
dc.contributor.authorCheng, Ming-Lungen_US
dc.contributor.authorWang, Shyh-Weien_US
dc.contributor.authorWu, Chung-Chengen_US
dc.contributor.authorChen, Ming-Jeren_US
dc.date.accessioned2014-12-08T15:07:04Z-
dc.date.available2014-12-08T15:07:04Z-
dc.date.issued2010-04-01en_US
dc.identifier.issn0018-9383en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TED.2010.2041508en_US
dc.identifier.urihttp://hdl.handle.net/11536/5547-
dc.description.abstractA method of MOSFET series resistance extraction is established in this paper. The core of this method relies on the constant mobility criteria, while for different gate lengths, it preserves the shape of universal mobility curves in the high-vertical-field regime. Consequently, the series resistance of a MOSFET can be extracted in an analytical and self-consistent manner, achieved without the knowledge of the gate oxide thickness, channel length, channel doping, or channel stress. Reasonable values of extracted series resistance are demonstrated in a wide range of gate length. Technology computer-aided design simulation further corroborates the validity of the proposed method, particularly for devices with heavily doped source/drain extensions. The constant mobility criteria with respect to the bulk charge linearization coefficient are also verified.en_US
dc.language.isoen_USen_US
dc.subjectMOSFETen_US
dc.subjectseries resistanceen_US
dc.subjectuniversal mobilityen_US
dc.titleA Novel Method of MOSFET Series Resistance Extraction Featuring Constant Mobility Criteria and Mobility Universalityen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TED.2010.2041508en_US
dc.identifier.journalIEEE TRANSACTIONS ON ELECTRON DEVICESen_US
dc.citation.volume57en_US
dc.citation.issue4en_US
dc.citation.spage890en_US
dc.citation.epage897en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000275998500019-
dc.citation.woscount6-
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