| 標題: | 氟與雜質對矽化鎢製程的影響 The roles of fluorine and dopants in W-polycide processes |
| 作者: | 許順良 Xu, Shun Liang 張俊彥 林茂雄 Zhang, Jun Yan Lin, Mao Xiong 電子研究所 |
| 公開日期: | 1993 |
| URI: | http://140.113.39.130/cdrfb3/record/nctu/#NT822430005 http://hdl.handle.net/11536/58517 |
| 顯示於類別： | 畢業論文 |
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- 氟離子佈植對低溫多晶矽薄膜電晶體之研究 / 楊哲育;Che-Yu Yang;張俊彥;張鼎張;Chun-Yen Chang
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