Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 邱榮照 | en_US |
| dc.contributor.author | 陳茂傑 | en_US |
| dc.date.accessioned | 2014-12-12T02:14:29Z | - |
| dc.date.available | 2014-12-12T02:14:29Z | - |
| dc.date.issued | 1994 | en_US |
| dc.identifier.uri | http://140.113.39.130/cdrfb3/record/nctu/#NT836430102 | en_US |
| dc.identifier.uri | http://hdl.handle.net/11536/59944 | - |
| dc.language.iso | zh_TW | en_US |
| dc.title | 銅化學氣相沉積技術開發與銅金屬化系統之可靠度研究 | zh_TW |
| dc.title | Development of Cu CVD technology and reliability issue of Cu metallization relevant to ULSI application | en_US |
| dc.type | Thesis | en_US |
| dc.contributor.department | 電子研究所 | zh_TW |
| Appears in Collections: | Thesis | |
