標題: 光學外差表面粗糙度測量術
Optical heterodyne profilometry
作者: 許武 憲 □Hsu, Wun Shan
蘇 德 欽
Su Der-Chin
光電工程學系
關鍵字: 電 光 晶 體;粗 糙 度;雙 折 射 透 鏡;E-O crystal;roughness;birefringent lens
公開日期: 1995
摘要: 本論文提出一種外差光學共軸的技術來量測物體表面的 粗糙度,運用
這技術的光學機構並與電腦結合,以達成自動化量測的目的並減少龐大資
料處理過程中的單調性,且能及時顯示測量結果也達到光電系統整合目的.
首先利用所調制的電光晶體得到差頻的目的,參考信號與測試信號之間的
相位差是粗糙的函數,藉由分析這函數可計算出表面粗糙度值.
We utilized the principle which foci are different for
parallel polarized beam and vertical polarized beam passing
through birefringent lens ;the beamwhich it is focused on the
sample surface and acts astest beam ; the other beam which is
collimated and illuminates a small area on the sample surface
and acts as reference beam . since E-O modulated , there is
frequency difference between the two orthogonal linear polarized
beams , then it measured phase change by a differential
interferometer and is to infer roughness by phase chang . this
arrangement is simple and analyze easily ; it do not damage the
sample surface and relatively cheap to probe-roughness senor.
URI: http://140.113.39.130/cdrfb3/record/nctu/#NT840124037
http://hdl.handle.net/11536/60167
顯示於類別:畢業論文