積體電路微影製程技術的趨勢分析與評估個案

Abstract

本研究的對象是積體電路製程中的微影技術，對其現有功能與未來發展趨 勢進行分析，並 以個案研究的方式驗證KT式方法在微影製程機台評選之 應用可行性，建立了系統化的 機台評估方法。 研究的結果，在微影製程與其技術分析方面，可供業者作為參考；同時個 案研究部份的評 估方法與過程可運用在企業的經營與決策上，幫助業者 提昇經營的效率及降低決策錯誤的 風險。 This study researches the photolithography technology in IC manufacturing process. Its function and technology developing trend were analysed. Beside that, this study verified the capability of KT method in lithographic mechanes' evaluation by a case study. That built up a systematic method for mechane selection. The study result of photolithography process and its technology analysis is useful to IC manufacturers. In the same time, the evaluation procedure of case study can be applied to companies' management. It helps managers to improve their efficiency and reduces the risk of error-decision.