標題: | Characteristics of Cerium Oxide for Metal-Insulator-Metal Capacitors |
作者: | Cheng, C. H. Hsu, H. H. Chen, W. B. Chin, Albert Yeh, F. S. 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
公開日期: | 2010 |
摘要: | In this article, we describe our successful fabrication of a CeO(2) metal-insulator-metal (MIM) capacitor with a low voltage nonlinearity. A low leakage current of 3.9 X 10(-7) A/cm(2) at -1 V and a small VCC-alpha similar to 421 ppm/V(2) were obtained at a high 10.8 fF/mu m(2) density for a Pt/CeO(2)/TaN MIM capacitor. The small VCC-alpha for a 15 nm thick CeO(2) dielectric (kappa similar to 20) was much better than the reported dielectrics of HfO(2), Tb-HfO(2), and Al(2)O(3)-HfO(2) at a similar kappa-value (15-20). The good analog performance was due to the combined effect of the CeO(2) dielectric and the high work-function metals. (C) 2009 The Electrochemical Society. [DOI: 10.1149/1.3258042] All rights reserved. |
URI: | http://hdl.handle.net/11536/6213 http://dx.doi.org/10.1149/1.3258042 |
ISSN: | 1099-0062 |
DOI: | 10.1149/1.3258042 |
期刊: | ELECTROCHEMICAL AND SOLID STATE LETTERS |
Volume: | 13 |
Issue: | 1 |
起始頁: | II16 |
結束頁: | II19 |
顯示於類別: | 期刊論文 |