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dc.contributor.authorChen, Min-Chenen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorHuang, Sheng-Yaoen_US
dc.contributor.authorChen, Shih-Chingen_US
dc.contributor.authorHu, Chih-Weien_US
dc.contributor.authorTsai, Chih-Tsungen_US
dc.contributor.authorSze, Simon M.en_US
dc.date.accessioned2014-12-08T15:07:53Z-
dc.date.available2014-12-08T15:07:53Z-
dc.date.issued2010en_US
dc.identifier.issn1099-0062en_US
dc.identifier.urihttp://hdl.handle.net/11536/6214-
dc.identifier.urihttp://dx.doi.org/10.1149/1.3360181en_US
dc.description.abstractThis study investigates a sputtered InGaZnO (IGZO) thin film to apply into a resistive random access memory device. After the formation of an indium tin oxide (ITO)/IGZO/ITO structure at room temperature, the device exhibits a repeatable bipolar resistance switching behavior without an electroforming process and an excellent transmittance in the visible region. The conduction mechanisms for low and high resistance states are dominated by Ohm's law and space-charge-limited current behavior, respectively. In retention and endurance tests, a resistance ratio of more than 1 order remains after 10(4) s at 90 degrees C and after 100 dc voltage sweeping cycles. (C) 2010 The Electrochemical Society. [DOI: 10.1149/1.3360181] All rights reserved.en_US
dc.language.isoen_USen_US
dc.titleBipolar Resistive Switching Characteristics of Transparent Indium Gallium Zinc Oxide Resistive Random Access Memoryen_US
dc.typeArticleen_US
dc.identifier.doi10.1149/1.3360181en_US
dc.identifier.journalELECTROCHEMICAL AND SOLID STATE LETTERSen_US
dc.citation.volume13en_US
dc.citation.issue6en_US
dc.citation.spageII191en_US
dc.citation.epageII193en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000276619300021-
dc.citation.woscount52-
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