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dc.contributor.author謝東衡en_US
dc.contributor.authorShie, Tung-Hengen_US
dc.contributor.author謝正雄en_US
dc.contributor.authorShie, Jin-Shownen_US
dc.date.accessioned2014-12-12T02:18:02Z-
dc.date.available2014-12-12T02:18:02Z-
dc.date.issued1996en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#NT853124020en_US
dc.identifier.urihttp://hdl.handle.net/11536/62310-
dc.description.abstract本論文旨在運用犧牲層之技術製作微感測元件所需之懸浮薄板。研究的方法是利用多晶矽當犧牲層,氮化矽、富矽氮化矽、ONO或 NON 之三明治結構等當浮板結構層,以期製作微感測器所需之大型薄板。文中並探討犧牲層製作之技術及懸浮薄板的應力問題,以及因落差所造成的階梯涵蓋面問題。對未來,如何製作更大型薄板及熱阻型微感測器亦做概略性描述。zh_TW
dc.description.abstractThis thesis presents that the technology of sacrificial layer was used by the fabrication of suspended membrane for microsensor. We used polysilicon as a sacrificial layer, Si3N4, Si-rich nitride, ONO or NON of sandwish structure as a structural layer to fabricate the large membrane for microsensor. We also discuss the technology of sacrificial layer and the problem caused by thin film stress and by step coverage. For the future, how to fabricate the microbolometer and the larger membrane for microsensor is outlined.en_US
dc.language.isozh_TWen_US
dc.subject多晶矽zh_TW
dc.subject懸浮浮板結構zh_TW
dc.title以多晶矽為犧牲層之懸浮浮板結構之製作zh_TW
dc.titleFormation of Special Floating Membrane Structure with Sacrificial Polysiliconen_US
dc.typeThesisen_US
dc.contributor.department光電工程學系zh_TW
顯示於類別:畢業論文