綜合應用各種光學方法來改善積體電路光學微影製程之模擬與研究

Abstract

在本論文中，我們以自行所發展的光學微影模擬程式來模擬整個光學微影曝光系統，並可針對傳統光罩或相位移光罩作自動化之光學鄰近效應修正。我們也在模擬程式裹加入了偏軸照射與光瞳濾波等解像技術，並結合應用上述四种技術對0.175um線幅寬度之密集相間的線隙、孤立線、孤立線、孤立隙與接觸孔等四种光罩圖案來進行模擬實驗，且對其結果作評估研究。

In this thesis, we develope a computer simulation program to simulate optical microlitvhography systems and perform automatic computer generation of a corrected mask pattern for conventional mask or Phaseshifting mask (PSM). We also have Off-axis illumination (OAI) and Pupli filtering of super-resolution technology in our computer simulation program, we combine these four technology and use them for dense lines and spaces, isolated line, isolated space, contact hole mask patterns of 0.175 um feature size to simulate and study on these results.