半導體製造業空氣環境績效指標及指標污染物之建立

Abstract

「半導體製造業空氣污染管制及排放標準」已在民國89年7月1日正式施行，加上國際之ISO 14000環境管理系統已被國內許多工廠納入管理制度中，然而至今各界對半導體製造業所排放出之空氣污染物種對人體及環境之影響，以及其應優先管制之污染物種排序仍缺乏一量化準則，因此本研究之主要目的在藉由ISO 14031環境績效評估的程序，研擬半導體廠空氣環境績效指標，並求出指標污染物之排序，以有效管制半導體排放之空氣污染物。本研究首先藉由工廠問卷調查及現場訪查，取得新竹科學園區內晶圓代工廠及DRAM廠之空氣污染基本資料，另外考慮半導體業對環境之潛在影響，利用德菲法專家問卷調查，求得各環境績效指標之權重，並瞭解指標污染物應得到之重視程度。此外，期望藉由晶圓代工廠之平均排放係數、運作量係數及周界監測值三種運算工具，計算污染物各環境狀態指標值，並配合問卷所得之各項指標權重，求出半導體指標污染物種之排序。 研究結果指出，空氣環境績效指標之優先順序為排放總量、防制設備操作效率、人體健康影響指標、周界空氣品質、臭味指標、地球溫暖化潛勢及臭氧生成潛勢，其中以前6項指標普遍受到半導體從業人員之重視，而專家學者普遍認為重要之指標只有前5項。綜合三種運算工具所得污染物排序之結果，指出硫酸、氨氣、鹽酸及丙酮為排序較前面之污染物種，因此可建議環保單位加強進行前述污染物之管制。本研究另外建立了操作績效指標以及環境狀態指標評估記錄表，以提供半導體個別工廠管制其所排放之空氣污染物。

The Taiwan EPA promulgated “The Control and emission standard of air pollutant in semi-conductor industry” in July 2000 to control the air pollutant emissions from the semi-conductor industry. And ISO (International Standard Organization) 14000 Environmental Management System is also adopted by many industrial plants including the Wafer Industry. However, there is limited information on the air pollution status in the semiconductor wafer industry. The purpose of this project is to establish Environmental Performance Indicators (EPIs) and indicated pollutants according to the ISO 14031 Environmental Performance Evaluation (EPE) for wafer industry. The results indicated that, the sequence in the orders of importance environmental performance indicators for air quality is Total Emission, Removal Efficiency of Control Device, Human Helth Effect, Ambient Air Level Goals, Odor Potentials, Global Warming Potentials, and Photochemical Ozone Creation Potentials. The damaging sort of air pollutions computed by ambient concentration, emission factor, and stuff factor could be a helpful tool to decide the prior list of pollutant reduction. It also showed that the priority air poluutants that should be regulated and control are Sulfuric Acid, Ammonia, Hydrochloric Acid and Acetone.