利用原子力顯微鏡加工技術設計製作薄膜式電磁線圈

Abstract

隨著光學儲存容量與密度的增加，在資料寫入方面的速度也必須不斷的改進，為了達成高速寫入的動作，近場光碟機必須提供更大的磁場強度與更快的調變頻率。本研究主要在設計並製作薄膜式電磁線圈以提高調變頻率。透過調變頻率的加快，記錄層改變的越快，以達到高速寫入的目的。為了製作此電磁線圈，本研究先計算磁場強度得知磁場之最大值發生在最內圈的周圍，此外磁場強度也隨著電流的加大、線圈厚度與線寬的增加而隨之增加，然而影響調變頻率的電感值，則在線圈內徑等於外圈半徑一半時達到最小。線圈並且使用原子力顯微鏡的微影技術，採用接觸式與半接觸式交錯加工，利用探針刮除金基版線圈的部分，以完成奈米線圈之前段製作。此線圈之內徑為2000nm、外徑8400nm、線寬800nm、線距400nm、圈數3圈。

With the increase of optical recording capacity and density, higher and higher writing speed is demanded. Hence, pickup head coils in the near-field recording devices have to possess a large enough magnetic field strength and modulation frequency. To achieve large magnetic field and modulation frequency, this study computes magnetic field for magnetic thin-film coils of different materials, turn numbers, thickness, and line widths. The magnetic field is proportional to applied current and the maximum magnetic field occurs around the innermost turn. The minimum inductance occurs when the inside diameter of the coil equals to half of the outside diameter. A thin layer of Au coated on the silicon wafer is dealt with by an atomic force microscope and a precision X-Y stage in force lithography. The tapping mode and the contact mode are alternately executed to obtain a nanocoil. The coil has inside diameter of 2000nm, outside diameter 8400nm, line width 800nm, circle distance 400nm, and 3 turns.