Improved hot carrier reliability in strained-channel NMOSFETS with TEOS buffer layer

標題:	Improved hot carrier reliability in strained-channel NMOSFETS with TEOS buffer layer
作者:	Lu, Ching-Sen Lin, Horng-Chih Lee, Yao-Jen Huang, Tiao-Yuan 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics
公開日期:	2007
URI:	http://hdl.handle.net/11536/7212 http://dx.doi.org/10.1109/RELPHY.2007.369562
ISBN:	978-1-4244-0918-1
DOI:	10.1109/RELPHY.2007.369562
期刊:	2007 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS - 45TH ANNUAL
起始頁:	670
結束頁:	671
Appears in Collections:	Conferences Paper

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