掺錫氧化銦超薄膜之低頻雜訊研究

標題:	掺錫氧化銦超薄膜之低頻雜訊研究 1/f noise in micrometer-sized ITO ultrathin films
作者:	許惟明 Hsu, Wei-Ming 林志忠 Lin, Juhn-Jong 物理研究所
關鍵字:	低頻雜訊;氧化銦錫;薄膜;1/f noise;Indium tin oxide;ITO;thin film
公開日期:	2012
摘要:	本論文主要測量低頻雜訊隨著退火溫度的變化，另外還有隨著溫度的變化，希望可以藉此了解低頻雜訊的變化趨勢，另外還有ITO薄膜之中低頻雜訊的產生原因。本論文之中主要是以ITO薄膜之中的載子流動性變化來做解釋。 We discuss low- frequency noise as the annealing temperature and measure temperature changes. We try to explain carriers’ transmission characteristic in ITO films by mobility fluctuation.
URI:	http://140.113.39.130/cdrfb3/record/nctu/#GT070052717 http://hdl.handle.net/11536/72385
Appears in Collections:	Thesis

Files in This Item:

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.