標題: Design, Fabrication, and Characterization of Novel Vertical Coaxial Transitions for Flip-Chip Interconnects
作者: Wu, Wei-Cheng
Chang, Edward Yi
Hwang, Ruey-Bing
Hsu, Li-Han
Huang, Chen-Hua
Karnfelt, Camilla
Zirath, Herbert
材料科學與工程學系
電信工程研究所
Department of Materials Science and Engineering
Institute of Communications Engineering
關鍵字: Coaxial;coplanar waveguide (CPW);flip-chip;interconnect;transition
公開日期: 1-May-2009
摘要: In this paper, a novel transition design using vertical "coaxial transition" for coplanar waveguide (CPW-to-CPW) flip-chip interconnect is proposed and presented for the first time. The signal continuity is greatly improved since the coaxial-type transition provides more return current paths compared to the conventional transition in the flip-chip structure. The proposed coaxial transition structure shows a real coaxial property from the 3-D electromagnetic wave simulation results. The design rules for the coaxial transition are presented in detail with the key parameters of the coaxial transition structure discussed. For demonstration, the back-to-back flip-chip interconnect structures with the vertical coaxial transitions have been successfully fabricated and characterized. The demonstrated interconnect structure using the coaxial transition exhibits the return loss below 25 dB and the insertion loss within 0.4 dB from dc to 40 GHz. Furthermore, the measurement and simulation results show good agreement. The novel coaxial transition demonstrates excellent interconnect performance for flip-chip interconnects and shows great potential for flip-chip packaging applications at millimeter waves.
URI: http://dx.doi.org/10.1109/TADVP.2009.2014997
http://hdl.handle.net/11536/7283
ISSN: 1521-3323
DOI: 10.1109/TADVP.2009.2014997
期刊: IEEE TRANSACTIONS ON ADVANCED PACKAGING
Volume: 32
Issue: 2
起始頁: 362
結束頁: 371
Appears in Collections:Articles


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