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dc.contributor.author吳居倫en_US
dc.contributor.author李建平en_US
dc.date.accessioned2014-12-12T02:51:39Z-
dc.date.available2014-12-12T02:51:39Z-
dc.date.issued2005en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#GT009311558en_US
dc.identifier.urihttp://hdl.handle.net/11536/78029-
dc.description.abstract我們成功地利用電子束微影系統(E-beam Lithography)與電感偶合電漿乾式蝕刻(Inductive Coupled Plasma Etching;ICP)在GaAs晶片上整合製作光子晶體線缺陷波導與邊射型雷射;本論文利用雷射L-I曲線、輸出頻譜以及近場發光圖形討論了不同偶合結構的偶合效率、對於邊射型雷射特性的影響以及在光子晶體線缺陷波導內的損耗。 將雷射光源與光子晶體線缺陷波導整合於單一晶片上可以讓其他光子晶體元件容易整合,同時對於未來積體光學的發展有很大的助益。zh_TW
dc.language.isozh_TWen_US
dc.subject光子晶體zh_TW
dc.subject半導體雷射zh_TW
dc.subjectPhotonic Crystalen_US
dc.subjectSemiconductor Laseren_US
dc.title光子晶體線缺陷波導與邊射型雷射整合研究zh_TW
dc.titleIntegration of Photonic Crystal Line Defect Waveguide and Edge-Emitting Laseren_US
dc.typeThesisen_US
dc.contributor.department電子研究所zh_TW
Appears in Collections:Thesis