标题: | 低温多晶矽薄膜电晶体光漏电流的研究 Study on Photo Leakage Current of Low Temperature poly Silicon Thin Film Transistors |
作者: | 胡晋玮 Chin-Wei Hu 刘柏村 Po-Tsun Liu 显示科技研究所 |
关键字: | 低温;多晶矽;薄膜电晶体;光;漏电流;Low Temperature;poly silicon;Thin Film Trsnsistor;Photo;Leakage Current |
公开日期: | 2006 |
摘要: | 近年来液晶显示器的需求急速升温,中小尺寸高亮度高对比的显示器需求也是成长近乎供不应求,例如在投影元件应用、行动通讯以及车用面板上都是。然而亮度提高相对的也会提高薄膜电晶体元件的光漏电流,此一漏电流的提高,会降低画面显示的对比度以及显示颜色的偏差。因此降低或抑制元件在高亮度下的光漏电流是必须要的。 在此论文研究中,我们提出了三种降低光漏电流的方式。第一种是改变元件的缓冲层与主动层的载子产生/复和中心;第二种是采取吸光层来取代原本的缓冲层,主要此吸光层是要减少被光源的光到达元件的主动层而使得该区域内的电子电动对因吸光获得能量,而产生漏电流;最后一种是使用不透光的金属材料,使他在元件主动层下方将被光源遮住,这是个非常有效的方式,可惜的是此他仍有些边际效应需要解决。在此文章里,我们研究了这几种抑制光漏电流的方法并观察其在各个结构的漏电流变化,企图想找处一种最适合的元件结构,当然,在此我们利用了低温多晶矽的薄膜电晶体来完成研究。 在这篇论文,我们呈现了改变元件结构的实验结果,接着我们还会针对各个结果进行讨论。 The market for liquid crystal displays has been rapidly expanding in recent years. The demand for a high luminance and a high contrast ratio in liquid crystal displays (LCDs), such as small-medium LCDs for projection device, mobile displays and displays for cars, is continuing to grow and seems insatiable. However, high luminance would increase photo leakage current (PLC) in the TFTs, which diminishes the voltages that are held across the pixel electrodes, which in turn, would cause a low contrast ratio Consequently, it is necessary to suppress the PLC in LCDs with high luminosity. There are three schemes to suppress the PLC. First scheme is to vary the center of generated / recombined between the buffer layer and poly-Si active layer so that the electron-hole pairs which were excited by back light. Second one is using the light-absorption structure sot that less light can reach the active layers of TFTs. The last one is using light-shielding structure, here we employ the opaque material to shield the light, it is the most effective to cut-off the light from the light source. Unfortunately, this method still has some side effect that we will have detail discuss later. In this thesis, we focus upon those methods and have examined how the PLC changes depending upon structural parameters of TFTs and pursuit a desirable device structures of the TFTs. This work has been done for the TFTs with low-temperature poly-Si (LTPS). In this article, we present the experimental results of how to the PLC changes depending on the different structure parameters of the TFTs, such as shielding and absorbing materials under the active poly-Si layer. Then, we have some discussion of the results and conclusion. |
URI: | http://140.113.39.130/cdrfb3/record/nctu/#GT009315538 http://hdl.handle.net/11536/78625 |
显示于类别: | Thesis |
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