標題: | Temperature-dependent capacitance characteristics of RF LDMOS transistors with different layout structures |
作者: | Hu, Hsin-Hui Chen, Kun-Ming Huang, Guo-Wei Chen, Ming-Yi Cheng, Eric Yang, Yu-Chi Chang, Chun-Yen 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | capacitance;drift region;laterally diffused MOS (LDMOS);layout structure;nonuniform doping;temperature |
公開日期: | 1-Jul-2008 |
摘要: | In this letter, the capacitance characteristics of RF LDMOS transistors with different temperatures and layout structures were studied. In a conventional fishbone structure, the peaks in capacitances decrease with increasing temperature. For the ring structure, two peaks in a capacitance-voltage curve have been observed at high drain voltages due to the additional corner effect. in addition, peaks in gate-to-source/body capacitance decrease and peaks in gate-to-drain capacitance increase with increasing temperature at high drain voltages. By analyzing the effects of temperature on threshold voltage, quasi-saturation current, and drift depletion capacitance, the variations of capacitances with temperature were investigated. |
URI: | http://dx.doi.org/10.1109/LED.2008.2000648 http://hdl.handle.net/11536/8647 |
ISSN: | 0741-3106 |
DOI: | 10.1109/LED.2008.2000648 |
期刊: | IEEE ELECTRON DEVICE LETTERS |
Volume: | 29 |
Issue: | 7 |
起始頁: | 784 |
結束頁: | 787 |
Appears in Collections: | Articles |
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