氣化氫氟酸在奈米金氧半電晶體之應用及其設備之開發(II)

標題:	氣化氫氟酸在奈米金氧半電晶體之應用及其設備之開發(II) Processes and System Development of HF-Vapor for Nano Mosfets' Application(II)
作者:	趙天生 CHAO TIEN-SHENG 交通大學電子物理系
公開日期:	2006
官方說明文件#:	NSC95-2221-E009-272
URI:	http://hdl.handle.net/11536/89739 https://www.grb.gov.tw/search/planDetail?id=1309496&docId=241986
Appears in Collections:	Research Plans