| 標題: | 高性能多用途之新結構低溫複晶矽薄膜電晶體之製作 High Performance and Versatile Low Temperature Polysilicon TFT Fabricated with New Structure |
| 作者: | 鄭晃忠 CHENG HUANG-CHUNG 交通大學電子工程系 |
| 公開日期: | 2000 |
| 官方說明文件#: | NSC89-2215-E009-069 |
| URI: | http://hdl.handle.net/11536/91441 https://www.grb.gov.tw/search/planDetail?id=720352&docId=135312 |
| Appears in Collections: | Research Plans |
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- Characterization of the novel polysilicon TFT with a subgate coupling structure / Chang, KM;Chung, YH;Deng, CG;Chung, YF;Lin, JH
- A novel high-performance poly-silicon thin film transistor with a self-aligned thicker sub-gate oxide near the drain/source regions / Chang, KM;Chung, YH;Lin, GM;Lin, JH;Deng, CG
- Novel low-temperature polysilicon thin-film transistors with a self-aligned gate and raised source/drain formed by the damascene process / Chang, Kow Ming;Lin, Gin Min;Yang, Guo Liang
- 用以改善劣化之新式有機發光二極體具負偏壓 驅動電路 / 張瑞心;Chang, Jui-Hsin;趙昌博;Chao, Paul C.-P.
- 多重通道及多重閘極的金屬誘化側向結晶之複晶矽薄膜電晶體的製作與特性分析 / 周政偉;Chou,Cheng-Wei;施敏;張鼎張;Prof. Simon M. Sze
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