奈米MOS元件之矽化物、超淺接面及接觸孔之研發(II)

標題:	奈米MOS元件之矽化物、超淺接面及接觸孔之研發(II) Development of Silicide, Ultra-Shallow Junction and Contact Hole in Nano MOS Devices (II)
作者:	雷添福 LEI TAN-FU 國立交通大學電子工程研究所
公開日期:	2003
官方說明文件#:	NSC92-2215-E009-022
URI:	http://hdl.handle.net/11536/91849 https://www.grb.gov.tw/search/planDetail?id=873438&docId=167326
Appears in Collections:	Research Plans

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